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Effect of horizontal flow on oxygen transfer in clean water and in clean water with surfactants

✍ Scribed by S. Gillot; S. Capela; A. Heduit


Book ID
117245008
Publisher
IWA Publishing
Year
2000
Tongue
English
Weight
140 KB
Volume
34
Category
Article
ISSN
0043-1354

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Water marks are one of the most common contamination problems, which induce various' kinds" of device defects in (LSI) technology. Water marks have been attributed to residues of water used in the cleaning process. However, the purity of deionized water used in LSI fabrication today is extremely hig