Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

✍ Scribed by Gui-Gen Wang; Hua-Yu Zhang; Hong-Fei Zhou; Xu-Ping Kuang; Qi-Bao Wu; Hong-Bo Zuo; Jie-Cai Han; Hong-Tao Ma

• Book ID: 108064210
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 746 KB
• Volume: 256
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2009.11.067