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Effect of charged deep states in hydrogenated amorphous silicon on the behavior of iron oxides nanoparticles deposited on its surface

✍ Scribed by Katarína Gmucová; Martin Weis; Vojtech Nádaždy; Ignác Capek; Alexander Šatka; Lívia Chitu; Július Cirák; Eva Majková

Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 651 KB
Volume: 254
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2008.05.093

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