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Effect of Ar+O2 Plasma Etching on Microwave Characteristics of YBa2Cu3O7-x Based Resonators

โœ Scribed by Ban, Masahito; Takenaka, Tsuyoshi; Hayashi, Kunihiko; Suzuki, Katsumi; Enomoto, Youichi


Book ID
115445294
Publisher
Institute of Pure and Applied Physics
Year
1996
Tongue
English
Weight
587 KB
Volume
35
Category
Article
ISSN
0021-4922

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