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Effect of Ar gas pressure on growth, structure, and mechanical properties of sputtered Ti, Al, TiAl, and Ti3Al films

✍ Scribed by M. Chinmulgund; R.B. Inturi; J.A. Barnard


Book ID
107864775
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
395 KB
Volume
270
Category
Article
ISSN
0040-6090

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