Effect of Ar annealing temperature on SiO2/4H-SiC interface studied by spectroscopic ellipsometry and atomic force microscopy

✍ Scribed by Zhong, Zhiqin; Zhang, Guojun; Wang, Shuya; Dai, Liping

• Book ID: 121358109
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 725 KB
• Volume: 16
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/j.mssp.2013.07.037