𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Effect of annealing on room temperature photoluminescence of polymeric precursor derived ZnO thin films on sapphire substrates

✍ Scribed by Uma Choppali; Brian P. Gorman


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
504 KB
Volume
31
Category
Article
ISSN
0925-3467

No coin nor oath required. For personal study only.

✦ Synopsis


The study of the effect of annealing on the room temperature photoluminescence (PL) of polycrystalline, textured zinc oxide (ZnO) thin films on sapphire substrates, synthesized via aqueous polymeric precursors, is presented. ZnO thin films exhibit strong, broad, and asymmetric near band edge ultra-violet (UV) PL peak without deep-level emissions. There is an increase of grain size and texture coefficient along the c-axis for the ZnO thin films with annealing temperature. XRD data reveals the presence of strain in the ZnO annealed films. The near band edge PL peak was deconvoluted using Gaussian approximations into contributions from free exciton recombination (FX) and its longitudinal optical (LO) phonon replicas. Deconvolution of the PL peaks reveals that the PL peak position does not shift with annealing. It is observed that with an increase in texturing, grain growth, and strain in the ZnO films, a first order LO phonon replica (FX-1LO) is present, which is forbidden in bulk ZnO crystals. Annealing of preferentially oriented ZnO films at high temperatures leads to a strain-induced exciton-phonon coupling due to an increase in grain sizes and texturing of films.


πŸ“œ SIMILAR VOLUMES


Photoluminescence properties of ZnO thin
✍ Tu Anh Trinh; In Seok Hong; Hwa Ryun Lee; Yong Sub Cho πŸ“‚ Article πŸ“… 2009 πŸ› Elsevier Science 🌐 English βš– 388 KB

ZnO thin films on sapphire substrate were fabricated by ion implantation combined with thermal oxidation. A sapphire substrate was implanted with 50 keV zinc ions at 350 Β°C with a fluence of 1.5 Γ‚ 10 17 ions cm Γ€2 , then annealed in a tube furnace in oxygen ambient in 2 h at 650 Β°C. Photoluminescenc

Effects of post-oxidation annealing temp
✍ Tedi Kurniawan; Yew Hoong Wong; Kuan Yew Cheong; Jeong Hyun Moon; Wook Bahng; Kh πŸ“‚ Article πŸ“… 2011 πŸ› Elsevier Science 🌐 English βš– 630 KB

ZrO 2 thin film has been formed on n-type 4H-SiC substrate using a combination of metal sputtering ( $ 25 nm thick) and thermal oxidation (15 min at 500 1C) processes. Effects of post-oxidation annealing temperature (600-900 1C) on the physical and electrical properties of the thin film have been in