𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Effect of additional VHF plasma source base on conventional RF-PECVD for large area fast growth microcrystalline silicon films

✍ Scribed by Youn J. Kim; Yoon S. Choi; In S. Choi; Jeon G. Han


Book ID
113514116
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
481 KB
Volume
11
Category
Article
ISSN
1567-1739

No coin nor oath required. For personal study only.