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Effect of 50 and 80 MeV phosphorous ions on the contribution of interface and oxide state density in n-channel MOSFETs

โœ Scribed by N.S Shinde; S.D Dhole; D Kanjilal; V.N Bhoraskar


Book ID
114171340
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
109 KB
Volume
156
Category
Article
ISSN
0168-583X

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