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EDS Microanalysis Colloquium in Berlin

✍ Scribed by Alexandra von Platen

Publisher: Wiley (John Wiley & Sons)
Year: 2007
Weight: 195 KB
Volume: 9
Category: Article
ISSN: 1439-4243
DOI: 10.1002/imic.200790169

No coin nor oath required. For personal study only.

✦ Synopsis

from the renowned Institute of Photonic Technologies (IPHT) demonstrated typical EDS user mistakes and how they can be avoided in order to achieve correct analysis results. He also pointed out that overlapping element lines are very common in EDS analysis and an EDS system with an extensive modern atomic data library helps achieve correct element identification. As a pioneer of the Peakto-Background ZAF correction method, the basis of the true standardless quantification method, Prof. Wendt also discussed how one can easily test the quality of a standardless analysis software.

The first presentation on June 12 th by Dr. Gudrun Horn-Samodelkin and Dr. Barbara Meyer, authorised experts for failure analysis and material testing of metals, dealt with the analysis of metals. Dr. Horn-Samodelkin described several application examples from her daily work and covered various analysis options such as spectra evaluation, element mapping and point analysis, giving the

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