✦ LIBER ✦
ECR plasma etch fabrication of C-doped base InGaAs/InP DHBT structures: A comparison of CH4/H2/Ar vs BCl3/N2plasma etch chemistries
✍ Scribed by R. F. Kopf; R. A. Hamm; R. J. Malik; R. W. Ryan; M. Geva; J. Burm; A. Tate
- Book ID
- 107457779
- Publisher
- Springer US
- Year
- 1998
- Tongue
- English
- Weight
- 227 KB
- Volume
- 27
- Category
- Article
- ISSN
- 0361-5235
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