Dynamics of void formation during implantation of Si under self-annealing conditions and their influence on dopant distribution

✍ Scribed by G. Lullu; P.G. Merli; A. Migliori; G. Brusatin; A.V. Drigo

• Book ID: 113284726
• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 361 KB
• Volume: 80-81
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(93)96181-b