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Dynamic scaling for Eley-Rideal reactions over rough surface

✍ Scribed by Ajay Chaudhari; Ching-Cher Sanders Yan; Shyi-Long Lee

Publisher
John Wiley and Sons
Year
2004
Tongue
English
Weight
102 KB
Volume
36
Category
Article
ISSN
0538-8066

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✦ Synopsis

Abstract

Eley‐Rideal reaction mechanism is studied over rough surface of random deposition model. Two types of rough surface are considered: (1) different rough surface with same surface density and (2) different rough surface with different surface density. Dynamic scaling theory, which is generally applied to the growing surface, is applied for this reaction mechanism to obtain the temporal and spatial scaling parameters α and β. The scaling parameters are found to be negative in contrast to the positive scaling parameters in surface growth model. The values of β are the same for both types of surface whereas the values of α are different. © 2004 Wiley Periodicals, Inc. Int J Chem Kinet 36: 286–292, 2004

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