Dynamic analyses in mass spectrometry of SF6 plasma during etching of silicon : Nobuki Mutsukura and Guy Turban. Vacuum 39(6), 579 (1989)

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 131 KB
• Volume: 30
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(90)90483-4