DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing

✍ Scribed by W.H. Bruenger; H. Buschbeck; E. Cekan; S. Eder; T.H. Fedynyshyn; W.G. Hertlein; P. Hudek; I. Kostic; H. Loeschner; I.W. Rangelow; M. Torkler

• Book ID: 114155780
• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 306 KB
• Volume: 41-42
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(98)00054-9