Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists

✍ Scribed by Matthias E. Bahlke; Hiroshi A. Mendoza; Daniel T. Ashall; Allen S. Yin; Marc A. Baldo

• Book ID: 115549124
• Publisher: John Wiley and Sons
• Year: 2012
• Tongue: English
• Weight: 752 KB
• Volume: 24
• Category: Article
• ISSN: 0935-9648
• DOI: 10.1002/adma.201202446