Dry etching of SiO2 and Si3N4: Peter H. Singer. Semiconductor int., 98 (May 1986)

• Publisher: Elsevier Science
• Year: 1987
• Tongue: English
• Weight: 115 KB
• Volume: 27
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(87)90577-4