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Dry etching of GaAs with Cl2: correlation between the surface Cl coverage and the etching rate at steady state

✍ Scribed by Chaochin Su; Ming Xi; Zi-Guo Dai; Matthew F. Vernon; Brian E. Bent


Book ID
104199101
Publisher
Elsevier Science
Year
1993
Weight
61 KB
Volume
282
Category
Article
ISSN
0167-2584

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