Dry development and trilevel resist etching in a DECR reactor

✍ Scribed by J. Dijkstra; G. van de Ven; H. Kalter

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 455 KB
• Volume: 14
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(91)90011-2