✦ LIBER ✦
Dry development and fine pattern fabrication PMIPK-Azide dry-developable resist in electron beam lithography
✍ Scribed by Minoru Tsuda; Mitsuo Yabuta; Kazuhiro Yamashita; Setsuko Oikawa; Akira Yokota; Nakane Hisashi; Kenji Gamo; Susumu Namba
- Publisher
- Elsevier Science
- Year
- 1984
- Tongue
- English
- Weight
- 636 KB
- Volume
- 2
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.