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Driving Force for Free-Carbon Incorporation in Chromium Carbide Films Processed by MOCVD

✍ Scribed by Constantin Vahlas; Nong Moon Hwang; Latifa Gueroudji; Francis Maury


Publisher
John Wiley and Sons
Year
1998
Tongue
English
Weight
213 KB
Volume
4
Category
Article
ISSN
0948-1907

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✦ Synopsis


3

Cu[S 2 CN( i Pr) 2 ]. This type of general approach has some advantages over conventional methods. We are at present developing the deposition of such materials and have most recently deposited CuInS 2 ; our current program is now aimed at the deposition of epitaxial layers and related quaternary materials.