✦ LIBER ✦
Dose-rate and temperature dependent statistical damage accumulation model for ion implantation into silicon
✍ Scribed by J.M. Hernández-Mangas; J. Arias; L.A. Marqués; A. Ruiz-Bueno; L. Bailón
- Book ID
- 104068415
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 294 KB
- Volume
- 228
- Category
- Article
- ISSN
- 0168-583X
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