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Doping-concentration dependence of a boron-doped p-type Ge layer grown on a Si (100) substrates by using RTCVD

✍ Scribed by Kil, Yeon-Ho; Yang, Hyeon Deok; Yang, Jong-Han; Kang, Sukill; Jeong, Tae Soo; Choi, Chel-Jong; Kim, Taek Sung; Shim, Kyu-Hwan; Kim, Dae-Jung


Book ID
121538165
Publisher
The Korean Physical Society
Year
2014
Tongue
English
Weight
519 KB
Volume
64
Category
Article
ISSN
0374-4884

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