Doping and annealing effects on ESR in chemically vapor deposited amorphous silicon: S. Hasegawa, T. Kasajima and T. Shimizu Solid St. Commun. 29, 13 (1979)

• Book ID: 108361016
• Publisher: Elsevier Science
• Year: 1980
• Tongue: English
• Weight: 256 KB
• Volume: 11
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/s0026-2692(80)80052-8