Dopant profiling of focused ion beam milled semiconductors using off-axis electron holography; reducing artifacts, extending detection limits and reducing the effects of gallium implantation

✍ Scribed by David Cooper; Cyril Ailliot; Jean-Paul Barnes; Jean-Michel Hartmann; Phillipe Salles; Gerard Benassayag; Rafal E. Dunin-Borkowski

• Book ID: 108291813
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 714 KB
• Volume: 110
• Category: Article
• ISSN: 0304-3991
• DOI: 10.1016/j.ultramic.2010.02.001