Dopant profile and defect control in ion implantation by RTA with high ramp-up rate

✍ Scribed by S. Saito; S. Shishiguchi; K. Hamada; T. Hayashi

• Book ID: 114194333
• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 614 KB
• Volume: 54
• Category: Article
• ISSN: 0254-0584
• DOI: 10.1016/s0254-0584(98)00015-7