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Dopant enhanced H diffusion in amorphous silicon and its effect on the kinetics of solid phase epitaxy

✍ Scribed by B.C. Johnson; P. Caradonna; J.C. McCallum


Book ID
108215619
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
534 KB
Volume
157
Category
Article
ISSN
0921-5107

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