Distortion evaluation of nickel stencil masks with the help of ion proximity exposures and registration measurements on the Leitz LMS- 2000

✍ Scribed by I.W. Rangelow; V. Lahr; R. Kassing; C. Bläsing-Bangert; K.-D. Röth; G. Bösch; A. Chalupka; R. Fischer; H. Löschner; R. Nowak; C. Traher; G. Stengl; H. Kraus; E. Bayer

• Book ID: 103598974
• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 302 KB
• Volume: 21
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(93)90091-i