✦ LIBER ✦
Dissociation mechanism of chlorosilane to silicon in low pressure microwave plasmas of argon and argon with hydrogen mixtures
✍ Scribed by R. Avni; U. Carmi; I. Rosenthal; R. Manory; A. Grill
- Publisher
- Elsevier Science
- Year
- 1983
- Tongue
- English
- Weight
- 492 KB
- Volume
- 107
- Category
- Article
- ISSN
- 0040-6090
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