Direct epitaxial growth of θ-Ni2Si by reaction of a thin Ni(10at.% Pt) film with Si(100) substrate

✍ Scribed by Panciera, Federico; Mangelinck, Dominique; Hoummada, Khalid; Texier, Michaël; Bertoglio, Maxime; De Luca, Anthony; Gregoire, Magali; Juhel, Marc

• Book ID: 121782850
• Publisher: Elsevier Science
• Year: 2014
• Tongue: English
• Weight: 940 KB
• Volume: 78-79
• Category: Article
• ISSN: 1359-6462
• DOI: 10.1016/j.scriptamat.2014.01.010