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Diffusion of indium implanted in silicon: The effect of the pre-amorphisation treatment and of the presence of carbon

โœ Scribed by S. Gennaro; M. Barozzi; M. Bersani; B.J. Sealy; R. Gwilliam


Book ID
103860250
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
270 KB
Volume
237
Category
Article
ISSN
0168-583X

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