✦ LIBER ✦

Diffusion of impurities from implanted silicon layers by rapid thermal annealing

✍ Scribed by Aleksandrov, O. V. ;Kozlovskii, V. V. ;Popov, V. V. ;Samorukov, B. E.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Enhanced Diffusion of Impurities in Sili

✍ Aleksandrov, L. N. ;Bondareva, T. V. 📂 Article 📅 1991 🏛 John Wiley and Sons 🌐 English ⚖ 197 KB

Enhanced diffusion phenomena during rapi

✍ Guimarães, S. ;Landi, E. ;Solmi, S. 📂 Article 📅 1986 🏛 John Wiley and Sons 🌐 English ⚖ 645 KB

Rapid Thermal Annealing of Arsenic Impla

✍ Chaussemy, G. ;Gontrand, C. ;Kumar, S. N. ;Canut, B. ;Barbier, D. ;Laugier, A. 📂 Article 📅 1991 🏛 John Wiley and Sons 🌐 English ⚖ 661 KB

Recrystallization, impurity migration an

✍ Tian-bing Xu; Pei-ran Zhu; Dai-qing Li; Ting-qi Ren; Hui-ling Sun; Shou-ke Wan 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 400 KB

Synthesis of buried silicon nitride laye

✍ C.M.S. Rauthan; Ami Chand; Sudhir Chandra; G. Bose 📂 Article 📅 1988 🏛 Elsevier Science 🌐 English ⚖ 277 KB

Rapid thermal annealing of high dose ars

✍ R. Kögler; E. Wieser; G. Otto; P. Knothe 📂 Article 📅 1990 🏛 Springer 🌐 English ⚖ 644 KB