Atomic diffusion in thin film reactions
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A.L. Greer
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Article
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1991
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Elsevier Science
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English
β 510 KB
Amorphous interfacial reaction layers are widely found in metal-silicon and metal-metal thin film systems and may be significant in themselves or in controlling the selection of crystalline reaction products. Such layers show a marked asymmetry in the diffusivities of their component species. For ea