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Diffusion length and junction spectroscopy analysis of low-temperature annealing of electron irradiation-induced deep levels in 4H-SiC

✍ Scribed by Castaldini, A.; Cavallini, A.; Rigutti, L.; Pizzini, S.; Le Donne, A.; Binetti, S.


Book ID
120350602
Publisher
American Institute of Physics
Year
2006
Tongue
English
Weight
318 KB
Volume
99
Category
Article
ISSN
0021-8979

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