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Diffusion behavior of single adatoms near and at steps during growth of metallic thin films on Ni surfaces

✍ Scribed by Chun-Li Liu; JamesB. Adams


Publisher
Elsevier Science
Year
1993
Weight
89 KB
Volume
294
Category
Article
ISSN
0167-2584

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The growth of thin Ti Ðlms on Al(001), Al(110) and Al(111) surfaces at room temperature has been studied using high-energy Rutherford backscattering spectroscopy (RBS) and channeling, x-ray photoelectron spectroscopy (XPS) and low-energy electron di †raction (LEED). Our results show that Ti atoms fo