Diffusion barrier cladding in Si/SiGe resonant interband tunneling diodes and their patterned growth on PMOS source/drain regions

✍ Scribed by Niu Jin; Sung-Yong Chung; Rice, A.T.; Berger, P.R.; Thompson, P.E.; Rivas, C.; Lake, R.; Sudirgo, S.; Kempisty, J.J.; Curanovic, B.; Rommel, S.L.; Hirschman, K.D.; Kurinec, S.K.; Chi, P.H.; Simons, D.S.

• Book ID: 114617186
• Publisher: IEEE
• Year: 2003
• Tongue: English
• Weight: 377 KB
• Volume: 50
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/ted.2003.815375