✦ LIBER ✦
Diffusion and permeation of He, Ne, Ar, Kr and D2 through silicon oxide thin films: W G Perkins and D R Begeal, J Chem Phys, 54 (4), 15th Feb 1971, 1683–1694
- Book ID
- 103460232
- Publisher
- Elsevier Science
- Year
- 1971
- Tongue
- English
- Weight
- 325 KB
- Volume
- 21
- Category
- Article
- ISSN
- 0042-207X
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