✦ LIBER ✦
Diffusion and defect annealing in silicon doped by phosphorus ion implantation: VV Titov, Phys Status Solidi (a), 2 (2), June 1970, 203–209
- Publisher
- Elsevier Science
- Year
- 1971
- Tongue
- English
- Weight
- 67 KB
- Volume
- 21
- Category
- Article
- ISSN
- 0042-207X
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