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Dielectric tunability and magnetoelectric coupling in LuFe2O4 epitaxial thin film deposited by pulsed-laser deposition

✍ Scribed by M. Zeng; J. Liu; Y.B. Qin; H.X. Yang; J.Q. Li; J.Y. Dai

Book ID
116943625
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
546 KB
Volume
520
Category
Article
ISSN
0040-6090

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Zr-Al-O dielectric films have been deposited on Pt-coated silicon substrates and directly on n-type Si substrates, respectively, by pulsed laser deposition technique using a (ZrO ) (Al O ) ceramic target. The 2 0.5 2 3 0.5 Zr-Al-O films deposited in 20 Pa oxygen ambient at 300 8C substrate temperat