Dielectric properties of TiO2-films reac
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P Alexandrov; J Koprinarova; D Todorov
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Article
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1996
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Elsevier Science
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English
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The dependence of the dielectric constant err chemical composition and crystalline structure of thin titanium oxide films, deposited onto Si substrates, on reactive sputtering conditions has been studied using an RF magnetron operated under different conditions of substrate temperature and 0, + Ar g