Dielectric properties of SiOx like films deposited from TMS/O2 mixture in low pressure microwave plasma

✍ Scribed by Kihel, M.; Sahli, S.; Zenasni, A.; Raynaud, P.; Segui, Y.

• Book ID: 122225051
• Publisher: Elsevier Science
• Year: 2014
• Tongue: English
• Weight: 641 KB
• Volume: 107
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/j.vacuum.2014.02.022