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Development of Sub-half Micrometric Structures with High Aspect Ratio Using a Multi-layer Lithography e-beam Process and Plasma Dry Etching

✍ Scribed by Mousinho, Ana Paula; Mansano, Ronaldo Domingues; Seabra, Antonio Carlos


Book ID
126712829
Publisher
Taylor and Francis Group
Year
2002
Tongue
English
Weight
451 KB
Volume
374
Category
Article
ISSN
1542-1406

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