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Development of pore size-controlled silica membranes for gas separation by chemical vapor deposition

โœ Scribed by Yudai Ohta; Kazuki Akamatsu; Takashi Sugawara; Aiko Nakao; Akira Miyoshi; Shin-Ichi Nakao


Book ID
108208222
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
977 KB
Volume
315
Category
Article
ISSN
0376-7388

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Carbon-based molecular sieve membranes f
โœ Liang-Jun Wang; Franklin Chau-Nan Hong ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 345 KB

Carbon-based molecular sieve (CMS) films for gas separation have been deposited on porous Al 2 O 3 disks using hexamethyldisiloxane (HMDSO) by a remote inductively-coupled-plasma (ICP) chemical vapor deposition (CVD) method. The H 2 /N 2 selectivities of the as-deposited films falled into the range