Development of new resist materials for 193-nm dry and immersion lithography

✍ Scribed by Yoko Takebe; Takashi Sasaki; Naoko Shirota; Osamu Yokokoji

• Book ID: 104050482
• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 104 KB
• Volume: 83
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2006.01.024