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Development of a new simulation model of spin coating process and its application to optimize the 450 mm wafer coating process

✍ Scribed by Jung-Yeul Jung; Yong Tae Kang; Junemo Koo


Book ID
108142585
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
591 KB
Volume
53
Category
Article
ISSN
0017-9310

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