Development of a New Ion-Beam Deposition Technology for Ultra-High-Purity Film Fabrication

✍ Scribed by Horino, Y. ;Tsubouchi, N. ;Enders, B. ;Heck, C. ;Chayahara, A. ;Kinomura, A. ;Fujii, K.

• Publisher: John Wiley and Sons
• Year: 1997
• Tongue: English
• Weight: 197 KB
• Volume: 160
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/1521-396x(199704)160:2<583::aid-pssa583>3.0.co;2-g