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Development of a 200 kV high current accelerator with post acceleration mass analysis for O+ implantation into silicon

✍ Scribed by G. Proudfoot; T.S. Green; M. Inman; C.M.O. Mahony


Book ID
113278754
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
394 KB
Volume
21
Category
Article
ISSN
0168-583X

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