✦ LIBER ✦
Development of a 100 nm gate power HEMT using four-layer resist and flexible e-beam exposure strategies
✍ Scribed by P.M. Frijlink; A. Collet; J. Bellaiche; M. Iost; M.J. Verheijen; H.R.J.R. van Helleputte; W.G.J. Moors; F.C.M.J.M. van Delft
- Book ID
- 104306296
- Publisher
- Elsevier Science
- Year
- 1997
- Tongue
- English
- Weight
- 293 KB
- Volume
- 35
- Category
- Article
- ISSN
- 0167-9317
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