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Determination of hole effective mass in SiO2 and SiC conduction band offset using Fowler–Nordheim tunneling characteristics across metal-oxide-semiconductor structures after applying oxide field corrections

✍ Scribed by Kumar Chanana, Ravi


Book ID
111986016
Publisher
American Institute of Physics
Year
2011
Tongue
English
Weight
844 KB
Volume
109
Category
Article
ISSN
0021-8979

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