Design for Manufacturability with Advanced Lithography

✍ Scribed by Bei Yu, David Z. Pan (auth.)

• Publisher: Springer International Publishing
• Year: 2016
• Tongue: English
• Leaves: 173
• Edition: 1
• Category: Library

✦ Synopsis

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

✦ Table of Contents

Front Matter....Pages i-xi
Introduction....Pages 1-6
Layout Decomposition for Triple Patterning....Pages 7-51
Layout Decomposition for Other Patterning Techniques....Pages 53-82
Standard Cell Compliance and Placement Co-Optimization....Pages 83-109
Design for Manufacturability with E-Beam Lithography....Pages 111-157
Conclusions and Future Works....Pages 159-162
Back Matter....Pages 163-164

✦ Subjects

Circuits and Systems; Processor Architectures; Electronics and Microelectronics, Instrumentation